Niobium Sputtering Targets

Browse niobium sputtering targets for metallic and reactive thin-film deposition. Specify tantalum limits and interstitial impurity limits where relevant to your process. Include a residual resistivity ratio (RRR) requirement only when the order calls for it.

See the current niobium sputtering target for chemistry and target-design information.

Information for a Target Enquiry

Send required purity, specified impurity limits, target shape, dimensions, tolerances and quantity. Include your drawing, backing or bonding requirements where applicable, and required chemistry, inspection or material documents for confirmation.

Read the purchasing guide or send your target requirements for a quotation.

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