Description
🏷 Ni50Cr50wt% Nickel Chromium Target – 99.99% High-Purity PVD Material
📖 Introduction
The Ni50Cr50wt% Nickel Chromium Target is one of the most widely used sputtering targets in the thin-film coating industry. This high-purity alloy combines nickel and chromium in a 50:50 weight ratio, offering excellent electrical resistivity, high-temperature stability, and outstanding oxidation resistance. When used in PVD coating systems, such as magnetron sputtering, the Ni50Cr50wt% Nickel Chromium Target enables the production of durable, uniform, and highly adherent thin films.
This material is especially suited for demanding applications in thin film deposition, microelectronics, semiconductor manufacturing, optical coatings, and magnetic media production. By using a High Purity NiCr Target, researchers and manufacturers achieve reproducible coating properties, consistent deposition rates, and minimal particle generation.
🧪 Composition & Purity
Our Ni50Cr50wt% Nickel Chromium Target is manufactured from carefully selected raw materials with a guaranteed purity level of 99.99% (4N). This ensures that impurities such as Fe, C, O, and N are kept below strict control limits, preventing contamination of your thin films.
| Element | Weight % | Typical Impurity Level |
|---|---|---|
| Nickel (Ni) | 50 ± 0.5 | < 0.002% |
| Chromium (Cr) | 50 ± 0.5 | < 0.002% |
| Total Impurities | ≤ 0.01% | Controlled by ICP-OES |
This precise composition is ideal for resistor films and applications that require stable sheet resistance over a wide temperature range.
📊 Physical & Mechanical Properties
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⚡ Electrical Resistivity: ~1.09 μΩ·m
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🔥 Melting Point: ~1400 °C
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🏋 Density: ≥ 8.4 g/cm³ (near-theoretical density)
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🌡 Thermal Expansion Coefficient: ~13.3 × 10⁻⁶ /K
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🎯 Microstructure: Fine, uniform grain structure
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🛡 Corrosion Resistance: Excellent in oxidizing atmospheres
The combination of these properties makes the Ni50Cr50wt% Nickel Chromium Target an industry benchmark for resistive and protective thin-film applications.
🏭 Manufacturing Process
Producing a high-quality Ni50Cr50wt% Nickel Chromium Target involves multiple steps designed to maximize purity, density, and performance:
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Raw Material Selection – High-purity Ni and Cr metals are sourced from certified suppliers.
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Vacuum Induction Melting (VIM) – The alloy is melted under vacuum to prevent contamination.
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Hot Isostatic Pressing (HIP) – The billet is densified under high temperature and pressure to remove internal porosity.
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CNC Machining – Precision machining ensures dimensional accuracy with tolerances up to ±0.1 mm.
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Surface Treatment – Grinding, lapping, or polishing is performed to achieve Ra ≤ 0.8 μm for optimal sputtering.
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Inspection & Testing – Ultrasonic, visual, and density inspections are conducted for each batch.
This rigorous process results in a High Purity NiCr Target that delivers consistent performance across multiple sputtering cycles.
⚙ Applications
Ni50Cr50wt% targets are widely used across many industries:
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🖥 Thin-Film Resistors – Ideal for producing resistor networks and precision shunt components.
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🔬 Semiconductors – Functional layers in integrated circuits and MEMS devices.
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🎥 Optical Coatings – Anti-reflective and decorative films on glass, plastic, and display panels.
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💽 Magnetic Media – Used in data storage and hard disk manufacturing.
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🛡 Protective Coatings – Heat- and corrosion-resistant films for aerospace and automotive applications.
For more details about thin-film technologies, visit Physical Vapor Deposition – Wikipedia.
🛠 Customization Options
We understand that each production line has unique requirements, so we offer:
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📏 Custom Dimensions: Diameter from 25 mm to 300 mm, thickness 1–20 mm.
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🧲 Backing Plates: Copper backing available for high-power magnetron sputtering.
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🔍 Surface Finish: Mirror-polished or ground finish to enhance film quality.
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🧪 Alternative Ratios: Ni80Cr20, Ni60Cr40, or fully custom compositions on request.
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📦 Special Packaging: Clean-room compatible, vacuum-sealed packaging available.
✅ Quality Assurance
Quality is critical in thin-film deposition, which is why every Ni50Cr50wt% Nickel Chromium Target is:
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📑 Certified: Supplied with EN 10204 3.1 Mill Test Certificate and COA.
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🔍 Inspected: 100% ultrasonic and visual inspection.
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🧪 Analyzed: ICP-OES chemical analysis and density measurement performed for each lot.
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📦 Traceable: Each target is labeled with batch number and heat number for full traceability.
Our production follows ISO 9001 quality management standards to guarantee consistent performance.
🌐 Benefits for End Users
Choosing a Ni50Cr50wt% Nickel Chromium Target provides several key advantages:
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🔧 Process Stability: Consistent sputter rate and film thickness control.
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🧼 Clean Films: Low impurity content ensures defect-free coatings.
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💰 Cost Efficiency: Long target life reduces downtime and replacement cost.
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🌍 Environmental Compliance: RoHS-compliant and environmentally friendly production.
🔗 Useful Links
📞 Contact Us
📧 Email: sales@niticu.com
📞 Phone / WhatsApp / WeChat: +86 13335373172
💬 WhatsApp Direct: Click to Chat
🏭 Factory: Baotai Road Industrial Park, High-tech Zone, Baoji City, Shaanxi, China
🌐 Website: https://niticu.com
📩 Contact us today for quotations, samples, and technical support — we respond within 24 hours.
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